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Wafer Cleaning System NAMIKI-ECCLEAR

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Designed for cleaning small wafers up to 2 inches in diameter.

Suitable for small wafers under development and biochip cleaning


Features

小型基板洗浄機
 Original Scrubber Cleaning System
High-efficiency particle removal is achieved without causing surface or subsurface damages.
ブラシ
 Drying System (Patent Pending)
High quality of drying for small wafers is achieved with decentering spin dryer.
特殊スピン乾燥機構
 Customizable Functionality
Able to customize according to specific needs.
 Applicable Objects
- Single crystal (GaN, SiC, AlN, Sapphire, Diamond)
- Optical glass
- Biochip

Example of cleaning results

5mm Sapphire substrate >
□5oサファイア基板


洗浄条件
5mm GaN Substrate > □5mmGaN基板  
  □5oGaN基板2
 
Particles were removed after cleaning without formation of latent flaws.
Lineup

Product name
Namiki-EcclearS
Namiki-Ecclear
Namiki-Ecclear L
Wafer size
greater than or equal to 2"
greater than or equal to 2"
2"~6"
Dimensions (mm)
( 400 x 400 x 600 )
480 x 600 x 1680
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Function
Wafer transportation
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Scrubber cleaning
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Decentering spin dryer
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( Standard spin dryer )
Megasonic cleaning
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HEPA filter
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*Eccler L is the product for cleaning larger wafers.
cleaning capability
Namiki is also providing contract wafer cleaning service.


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